SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS

摘要

[PROBLEMS] To provide a substrate cleaning method wherein substrate is not adversely affected. [MEANS FOR SOLVING PROBLEMS] A substrate cleaning method is provided for cleaning a substrate by using ozone water produced by a gas-liquid mixing method without using additives. The method is characterized in that the diameter (R) of ozone bubbles contained in the ozone water is 0<R=50nm. Since the diameter of the ozone bubble is within such range, buoyancy is not easily given from the ozone water. As a result, the ozone bubbles are prevented from moving up, and the ozone water is not easily degassed. Thus, sufficient cleaning effects are obtained by having the ozone water not easily degassed.