| 摘要 |
<P>PROBLEM TO BE SOLVED: To determine the gap of superposition accurately without being influenced by the inclination or contrast of a linear portion selected from an image even when projection processing (reduction of signal noise) is performed. <P>SOLUTION: The superposition measuring device comprises a means 26 for taking in the images of first and second marks put on different layers of a substrate 11; and a means 27 for determining the gap of superposition of the first and second marks by using a first signal waveform generated from the first linear portion of the first mark, and a second signal waveform generated from the second linear portion of the second mark. When at least one signal waveform is generated, light and shade variation when crossing the linear portion in the measuring direction is extracted at a plurality of different parts of the linear portion, and after the contrast of light and shade variation is arranged mutually, light and shade variation is integrated in the direction perpendicular to the measuring direction. <P>COPYRIGHT: (C)2007,JPO&INPIT |
