发明名称 DRESSER FOR POLISHING PAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a dresser for a polishing pad capable of adjusting the surface condition of the pad precisely and stably. <P>SOLUTION: The dresser is configured so that a metallized layer 5 is provided on a base 4 made of ceramic and abrasive grains 2 are attached firmly by plating 6a and 6b. As the ceramic constituting the base 4, alumina may be adopted. The metallized layer 5 may be formed from one or more elements selected among Mo, Mn, W, Ni, Ag, Cu, Ti, Nb, and Zr. The abrasive grains 2 may be of diamond, while the plating 6a and 6b may be Ni plating. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007229865(A) 申请公布日期 2007.09.13
申请号 JP20060054390 申请日期 2006.03.01
申请人 SUMITOMO METAL IND LTD 发明人 DOSONO MITSUHIKO
分类号 B24B53/12;H01L21/304 主分类号 B24B53/12
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