| 摘要 |
<P>PROBLEM TO BE SOLVED: To raise uniformity in illuminance within an illumination area. <P>SOLUTION: An exposure apparatus includes an illumination optical system 33 for performing illumination by superimposing light fluxes 32 which are wavefront-divided in the illumination area M, through the use of wavefront division element 35 composed of a plurality of reflection optical elements for wavefront-dividing the light fluxes emitted from a light source. The wavefront division element 35 comprises: an incident side optical system including a plurality of incident side element mirrors 35aa, and an emission side optical system including a plurality of emission side element mirrors 35bb. The apparatus also includes a changing means 25 for changing the advance direction of the light fluxes 32 to be reflected by at least one of the emission side element mirrors 35bb. <P>COPYRIGHT: (C)2007,JPO&INPIT |
