| 摘要 |
A method for exfoliating photoresist is provided to eliminate the necessity for an intermediate cleaning process by including an additive for preventing corrosion of a conductive pattern in a stripper. A photoresist pattern formed on a conductive pattern including at least one metal layer is processed by an additive(15) for preventing corrosion of the conductive pattern and a stripper including alkanol amine and is cleaned by deionized water so that an intermediate cleaning process using an organic solvent is omitted. The additive prevents an ionic bond of a metal ion included in the conductive pattern, the alkanol amine and a hydroxy ion generated by the deionized water.
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