发明名称 Process for forming zinc oxide film
摘要 <p>A process for forming zinc oxide film over a surface of a substrate which comprises a step of vaporising and supplying a materilal prepared by dissolving dimethylzinc or diethylzinc into an organic solvent to a chemical vapor deposition apparatus and a step of simultaneously supplying a gas comprising an oxidizing agent gas to the chemical vapor deposition apparatus. A process for forming zinc oxide film over a surface of a substrate which comprises both a step of supplying a vaporized gas of dimethylzinc or diethylzinc and a step of supplying a gas comprising an oxidizing agent gas alternately to a chemical vapor deposition apparatus. A process for forming zinc oxide film of extremely high quality and high purity on surfaces of various kinds of substrates safely in accordance with the CVD method is provided. </p>
申请公布号 EP1728893(A3) 申请公布日期 2007.09.05
申请号 EP20060010939 申请日期 2006.05.26
申请人 JAPAN PIONICS CO., LTD. 发明人 TAKAMATSU, YUKICHI;AKIYAMA, TOSHIO
分类号 C23C16/455;C23C16/40;C23C16/46 主分类号 C23C16/455
代理机构 代理人
主权项
地址