发明名称 |
Process for forming zinc oxide film |
摘要 |
<p>A process for forming zinc oxide film over a surface of a substrate which comprises a step of vaporising and supplying a materilal prepared by dissolving dimethylzinc or diethylzinc into an organic solvent to a chemical vapor deposition apparatus and a step of simultaneously supplying a gas comprising an oxidizing agent gas to the chemical vapor deposition apparatus. A process for forming zinc oxide film over a surface of a substrate which comprises both a step of supplying a vaporized gas of dimethylzinc or diethylzinc and a step of supplying a gas comprising an oxidizing agent gas alternately to a chemical vapor deposition apparatus. A process for forming zinc oxide film of extremely high quality and high purity on surfaces of various kinds of substrates safely in accordance with the CVD method is provided.
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申请公布号 |
EP1728893(A3) |
申请公布日期 |
2007.09.05 |
申请号 |
EP20060010939 |
申请日期 |
2006.05.26 |
申请人 |
JAPAN PIONICS CO., LTD. |
发明人 |
TAKAMATSU, YUKICHI;AKIYAMA, TOSHIO |
分类号 |
C23C16/455;C23C16/40;C23C16/46 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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