发明名称 CHARGED PARTICLE BEAM DEVICE FOR MOUNTING ABERRATION CORRECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam device in which the number of power supply for driving a plurality of poles constituting a multipolar lens of an aberration corrector having the multipolar lens in multiple stages is decreased, and cost is reduced without degrading the performance of aberration correction. SOLUTION: The aberration corrector 10 has a static magnetic type multipolar lens at a first stage 11 and the final stage 14, and a pair of electrostatic and static magnetic compound type multipolar lenses 12, 13 arranged in the regions interposed in between. A common current source corresponding to the type of magnetic field to be generated is connected to the coil provided in each pole of the multipolar lenses, and thereby, the number of the current sources is reduced. Also the voltage source of voltage to be impressed on each pole for generating the electric field is made common. The power source 26 is composed of these plurality of current sources and voltage sources. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007207634(A) 申请公布日期 2007.08.16
申请号 JP20060026500 申请日期 2006.02.03
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 NAKANO TOMONORI;YOSHIDA TAKAO
分类号 H01J37/153;H01J37/141;H01J37/145 主分类号 H01J37/153
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