INTERFEROMETRIC ANALYSIS FOR THE MANUFACTURE OF NANO-SCALE DEVICES
摘要
<p>The present invention features a system to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The system senses relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.</p>
申请公布号
EP1817545(A2)
申请公布日期
2007.08.15
申请号
EP20050858633
申请日期
2005.11.21
申请人
MOLECULAR IMPRINTS, INC.
发明人
NIMMAKAYALA, PAWAN K.;RAFFERTY, TOM H.;AGHILI, ALIREZA;CHOI, BYUNG-JIN;SCHUMAKER, PHILIP, D.;BABBS, DANIEL, A.;TRUSKETT, VAN, N.