Method and apparatus for monitoring gas flow amount in semiconductor manufacturing equipment

摘要

An apparatus for monitoring gas flow in a semiconductor manufacturing equipment, includes an exhaust line, a flow amount measuring unit, and a controller unit having a first input electrically connected to the flow amount measuring unit and a second input having a predetermined reference value, the controller unit having the capability of comparing data in the first input to the predetermined reference value in the second input and generate a signal when the data in the first input exceed the predetermined reference value. The apparatus of the present invention may be incorporated into a gas delivery system employed in semiconductor manufacturing to detect gas leaks.