发明名称 POLISHING SHEET AND POLISHING WORK METHOD
摘要 The present invention provides a polishing sheet that can secure a flatness of a material to be polished and can improve a polishing efficiency. A polishing pad 1 has a polyurethane sheet 2 made of polyurethane resin. The polyurethane sheet 2 has large cells 3 with a generally triangular sectional configuration rounded along a thickness direction thereof. Polyurethane resin exists in the polyurethane sheet 2 in a partition wall manner and fine foams 4 are formed in the polyurethane resin. Fine particles 5 added during manufacture of the polyurethane sheet 2 exist inside some of the fine foams 4 and the fine particles 5 are separable from the fine foams. By separating off fine particles positioned at a polishing face P by dummy polishing or the like, fine foams which evenly reserve a polishing liquid containing abrasive particles are formed at the polishing face P.
申请公布号 US2007184757(A1) 申请公布日期 2007.08.09
申请号 US20070733137 申请日期 2007.04.09
申请人 FUJI SPINNING CO., LTD. 发明人 KUME TAKAHIRO;TAKEDA HIDENORI
分类号 B24B1/00;B24B37/00;B24B7/19;B24B37/04;B24B37/20;B24B37/24;B24D3/00;B24D3/32;B24D11/00;B32B5/18;H01L21/304 主分类号 B24B1/00
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