发明名称 COMPOSITION FOR ORGANIC SEMICONDUCTOR, METHOD OF MANUFACTURING TRANSISTOR, METHOD OF MANUFACTURING ACTIVE MATRIX DEVICE, METHOD OF MANUFACTURING ELECTRO-OPTIC DEVICE, AND METHOD OF MANUFACTURING ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a composition for an organic semiconductor capable of forming an organic semiconductor layer of high storage stability and excellent properties, a method of manufacturing a transistor capable of manufacturing a high-reliability transistor using the same, a method of manufacturing an active matrix device, a method of manufacturing an electro-optic device, and a method of manufacturing electronic equipment. SOLUTION: The composition for the organic semiconductor contains an organic semiconductor material which includes thiophene rings and alkyl chains, and an organic solvent which includes cis-decalin. The composition for the organic semiconductor is used for example to form an organic semiconductor layer 30 for transistors each having a source electrode 20a and a drain electrode 20b arranged mutually separated from each other, an organic semiconductor layer 30 arranged so as to cover the source electrode 20a and the drain electrode 20b, a gate insulating layer 40 arranged on the organic semiconductor layer 30, and a gate electrode 50 arranged on the gate insulating layer 40. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007201418(A) 申请公布日期 2007.08.09
申请号 JP20060286722 申请日期 2006.10.20
申请人 SEIKO EPSON CORP 发明人 MASUDA TAKASHI
分类号 H01L51/30;H01L21/312;H01L21/368;H01L29/786;H01L51/05;H01L51/40 主分类号 H01L51/30
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