发明名称 |
SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface position detecting apparatus capable of accurately detecting a surface position of a surface to be detected. <P>SOLUTION: The surface position detecting apparatus 2 includes a light-sending optical system SL for sending detecting light supplied from a light source 1a onto a surface to be detected W from a diagonal direction; a light-receiving optical system RL for receiving the detecting light reflected by the surface to be detected W; and a detector 38 for detecting the detecting light via the light-receiving optical system RL and detects the surface position of the surface to be detected W on the basis of output of the detector 38. The wavelength of the detecting light includes the near-infrared wavelength. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007192725(A) |
申请公布日期 |
2007.08.02 |
申请号 |
JP20060012441 |
申请日期 |
2006.01.20 |
申请人 |
NIKON CORP |
发明人 |
NAGAYAMA TADASHI |
分类号 |
G01B11/00;G03F7/20;H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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