发明名称 |
INTEGRATED CIRCUIT SYSTEM WITH DUMMY REGION |
摘要 |
An integrated circuit system comprised by forming a first region, a second region and a third region within a dielectric over a substrate. The first region includes tungsten plugs. The second region is formed adjacent at least a portion of the perimeter of the first region and the third region is formed between the first region and the second region. An opening is formed in the third region and a material is deposited within the opening for preventing erosion of the first region.
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申请公布号 |
US2007173016(A1) |
申请公布日期 |
2007.07.26 |
申请号 |
US20060307142 |
申请日期 |
2006.01.25 |
申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING LTD. |
发明人 |
LIU DONG SHENG;LIM CING GIE;MAHADEVAN SUBBIAH CHETTIAR;CHEN FENG |
分类号 |
H01L21/8242 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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