发明名称 |
TWO-DIMENSIONAL APERTURE ARRAY FOR VAPOR DEPOSITION |
摘要 |
<p>A method for forming a layer on a surface in making a device, including providing a distribution member for receiving vaporized material, the distribution member having one or more walls defining a polygonal two-dimensional pattern of apertures is formed in a wall, which deliver vaporized material in a molecular flow onto the surface; providing the polygonal two-dimensional pattern of apertures to have at least four vertices, with a first set of apertures (80) disposed at the vertices, a second set of edge apertures (78) disposed between the apertures of the first set and defining the edges of the polygonal two-dimensional pattern, and a third set of interior apertures (74) disposed within the periphery of the polygonal two-dimensional pattern defined by the first and second sets of apertures; and dimensioning the apertures to obtain a desired flow rate.</p> |
申请公布号 |
WO2007084275(A1) |
申请公布日期 |
2007.07.26 |
申请号 |
WO2007US00425 |
申请日期 |
2007.01.05 |
申请人 |
EASTMAN KODAK COMPANY;GRACE, JEREMY MATHEW;LONG, MICHAEL |
发明人 |
GRACE, JEREMY MATHEW;LONG, MICHAEL |
分类号 |
C23C16/455;C23C14/04 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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