发明名称 TWO-DIMENSIONAL APERTURE ARRAY FOR VAPOR DEPOSITION
摘要 <p>A method for forming a layer on a surface in making a device, including providing a distribution member for receiving vaporized material, the distribution member having one or more walls defining a polygonal two-dimensional pattern of apertures is formed in a wall, which deliver vaporized material in a molecular flow onto the surface; providing the polygonal two-dimensional pattern of apertures to have at least four vertices, with a first set of apertures (80) disposed at the vertices, a second set of edge apertures (78) disposed between the apertures of the first set and defining the edges of the polygonal two-dimensional pattern, and a third set of interior apertures (74) disposed within the periphery of the polygonal two-dimensional pattern defined by the first and second sets of apertures; and dimensioning the apertures to obtain a desired flow rate.</p>
申请公布号 WO2007084275(A1) 申请公布日期 2007.07.26
申请号 WO2007US00425 申请日期 2007.01.05
申请人 EASTMAN KODAK COMPANY;GRACE, JEREMY MATHEW;LONG, MICHAEL 发明人 GRACE, JEREMY MATHEW;LONG, MICHAEL
分类号 C23C16/455;C23C14/04 主分类号 C23C16/455
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