| 发明名称 |
Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition |
| 摘要 |
<p>A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a pattern forming method using a photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation.</p> |
| 申请公布号 |
EP1536285(A3) |
申请公布日期 |
2007.07.25 |
| 申请号 |
EP20040027406 |
申请日期 |
2004.11.18 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
WADA, KENJI;KODAMA, KUNIHIKO |
| 分类号 |
G03F7/004;C07C309/39;C07C309/42;C07C323/66;C07C381/12;G03F7/038;G03F7/039;G03F7/075;G03F7/20;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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