METHOD OF MANUFACTURING DISPLAY SUBSTRATE

摘要

A method for manufacturing a display substrate is provided to prevent contact defects and to improve electrical properties by reducing the number of etching processes with respect to a passivation layer. A gate pattern including a gate line, a gate electrode(G) of a switching device, and a storage line is formed. A source pattern including a source line, a source electrode(S), and a drain electrode(D) of a switching device is formed on a base substrate(110) where the gate pattern is formed. A passivation layer(170) is formed on the base substrate where the source pattern is formed. A photoresist pattern is formed. An opening unit(182e) is formed on the photoresist pattern to expose the passivation layer corresponding to the drain electrode. The passivation layer exposed through the opening unit is removed to form a contact hole exposing the drain electrode. A transparent electrode layer is formed on the base substrate where the contact hole is formed to be contacted to the exposed drain electrode. The photoresist pattern is removed to form a pixel electrode where the transparent electrode layer is patterned.