发明名称 Two Dimensional Nanostructure Fabrication Method and Two Dimensional Nanostructure Fabricated Therefrom
摘要 Disclosed herein is a method of fabricating a two dimensional (2D) nanostructure. The method includes heating a substrate within a vacuum chamber, injecting a metallic material into the vacuum chamber, adsorbing the metallic material on a surface of the substrate, and cooling the substrate to fabricate the 2D nanostructure on the surface of the substrate. The 2D nanostructures can be fabricated as monolayers.
申请公布号 US2007161259(A1) 申请公布日期 2007.07.12
申请号 US20060548442 申请日期 2006.10.11
申请人 SAMSUNG ELECTRONICS CO. LTD. 发明人 SONG SE-AHN;LATYSHEV ALEXANDER V.;FEDINA LUDMILA I.;GUTAKOVSKII ANTON K.;KOSOLOBOV SERGEY S.
分类号 H01L21/31;H01L21/469 主分类号 H01L21/31
代理机构 代理人
主权项
地址