| 摘要 |
<p>An immersion lithography apparatus is provided to prevent the contamination of a wafer and to perform effectively an immersion lithography process by isolating an immersion liquid from the wafer using a box type structure of an immersion unit. An immersion lithography apparatus includes a light source unit, a reticle stage, a projection lens unit(150) and a wafer stage(140). The immersion lithography apparatus further includes an immersion unit(130) arranged between the projection lens unit and the wafer stage. The immersion unit is used for storing an immersion liquid(170). The immersion unit includes a box type structure capable of isolating the immersion liquid from a wafer. The sidewalls and bottom of the box type structure are made of fluoro-polymer based compound.</p> |
