| 摘要 |
A bubbling canister of a chemical vapor deposition apparatus, which can ensure stable supply of chemicals, is provided. A bubbling canister(100) of a chemical vapor deposition apparatus comprises: a container(110) filled with chemicals, an injection pipe(130) which injects a gas into the container to bubble the chemicals filled in the container, and in which a plurality of holes are formed to disperse and eject the gas injected into the chemicals, and a discharge pipe(140) for discharging the bubbled chemicals to the outside of the container. The injection pipe includes an introduction part(130a) for introducing the gas, and an ejection part(130b) in which the plurality of holes(135) are formed, and the injection pipe is bent between the introduction part and the ejection part. The injection pipe is formed in an "L" shape. The container includes an opened upper part, and a cover(120) for covering the opened upper part to seal the container. The injection pipe and the discharge pipe are installed on the cover.
|
