发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION AND UTILIZATION THEREOF |
摘要 |
<p>A photosensitive resin composition which can be imidized at a lower temperature than conventional ones and which, when superposed as a photosensitive dry film resist on an FPC substrate or the like, causes little warpage and is excellent in flexibility, flexural properties, electrical reliability, and photosensitivity. It has flame retardancy. The photosensitive resin composition is characterized by comprising (A) a polyimide precursor comprising specific structural units, (B) a (meth)acrylate compound, (C) a photoreaction initiator, and (D) a phosphorus compound flame retardant.</p> |
申请公布号 |
WO2007074660(A1) |
申请公布日期 |
2007.07.05 |
申请号 |
WO2006JP325036 |
申请日期 |
2006.12.15 |
申请人 |
KANEKA CORPORATION;NOJIRI, HITOSHI;OKADA, KOJI;YAMANAKA, TOSHIO;KOJIMA, KOHEI |
发明人 |
OKADA, KOJI;YAMANAKA, TOSHIO;KOJIMA, KOHEI;NOJIRI, HITOSHI |
分类号 |
G03F7/075;C08G73/10;G03F7/004;G03F7/037 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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