AN APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES AND METHOD FOR CLEANING A CHAMBER OF THE APPARATUS

摘要

An apparatus for fabricating a semiconductor device is provided to improve chamber cleaning efficiency by using an in-situ cleaning unit and a remote plasma cleaning unit in a cleaning a chamber. A space for performing a fabricating process is defined in a chamber(10). A chuck(14) is positioned in the lower part of the space to support a substrate. A shower head supplies process gas to the substrate supported by the chuck, positioned in the upper part of the space. The chamber is cleaned by a cleaning member including an in-situ cleaning unit(20) and a remote plasma cleaning unit(30). The in-situ cleaning unit generates plasma from the cleaning gas supplied to the inside of the chamber to clean the chamber. The remote plasma cleaning unit generates plasma outside the chamber and supplies the plasma to the inside of the chamber. The remote plasma cleaning unit can supply plasma from the lateral direction of the chamber to the inside of the chamber horizontally.