| 摘要 |
A gas barrier transparent resin substrate which is manufactured by forming a transparent oxide film comprising a tin oxide amorphous film or a tin oxide based amorphous film containing a tin oxide and at least one addition element selected from the group consisting of Si, Ge, Al, Ce and In in a proportion of 0.2 to 45 atomic % relative to the total amount of the addition element and Sn, as a gas barrier layer, on at least one surface of a resin film base material, to thereby prepare a gas barrier transparent resin substrate; a flexible display element using the above gas barrier transparent resin substrate. A silicon oxide film or a silicon nitride film may be formed on the transparent oxide film of the gas barrier transparent resin substrate, to thereby form a two-layer film. Further, a flexible display element can be manufactured from the gas barrier transparent resin substrate through providing a transparent electrode film thereon. The above gas barrier transparent resin substrate exhibits better surface smoothness, higher transparency, and higher steam barrier capability, as compared to a conventional one.
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