发明名称 Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same
摘要 The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.
申请公布号 US2007149702(A1) 申请公布日期 2007.06.28
申请号 US20060642628 申请日期 2006.12.21
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 ANDO NOBUO;TAKEMOTO ICHIKI;YOSHIDA ISAO;HARADA YUKAKO
分类号 C09D5/02 主分类号 C09D5/02
代理机构 代理人
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