发明名称 |
Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same |
摘要 |
The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.
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申请公布号 |
US2007149702(A1) |
申请公布日期 |
2007.06.28 |
申请号 |
US20060642628 |
申请日期 |
2006.12.21 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
ANDO NOBUO;TAKEMOTO ICHIKI;YOSHIDA ISAO;HARADA YUKAKO |
分类号 |
C09D5/02 |
主分类号 |
C09D5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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