| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin, high-hardness, durable and transparent anti- reflection film having excellent adhesiveness to base material, and its manufacturing method. SOLUTION: One layer of anti-reflection layers is formed as a high-refractive index layer formed by coating a metal alkoxide having no activation energy beam reactive group, one compound selected from hydrolyzed products thereof, namely, a metal alkoxide compound shown by the formula or an activation energy beam reactive compound excluding compounds shown by the formula, and a high-refractive index layer composition containing an organic solvent, and by irradiating an activation energy beam. In the formula: M(R1)m(R2)n(OR3)p, M is a metal, O is an oxygen atom, R1 is an activation energy beam reactive group, such as a vinyl group, an isopropenyl group, an allyl group, R2 is an aliphatic hydrocarbon group having a carbon atom number of 1-4, R3 is an aliphatic hydrocarbon group having a carbon atom number of 1-4 or a hydrogen atom, q is a valence of the metal with an equation, m+n+p=q, and with relations, q-1>=m>=1, q-1>=p>=1, q-1>=n>=0, and (m), (n) and (p) are positive integers. |
