发明名称 PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND PERMANENT PATTERN
摘要 <p>Disclosed is a photosensitive composition having excellent developability, soldering heat resistance, fracture resistance and pressure cooker resistance which is preferably used for manufacturing flexible printed circuit boards. The cured coating film of such a photosensitive composition is significantly improved in flexibility. Also disclosed are a method for forming a pattern and a permanent pattern. The photosensitive composition contains at least a polyurethane resin (A) having a carboxyl group, a polymerizable compound (B), a photopolymerization initiator (C) and a thermal crosslinking agent (D). The polyurethane resin (A) having a carboxyl group is preferably obtained by reacting a diisocyanate compound represented by the constitutional formula (I) below with a diol compound represented by the constitutional formula (II) or the constitutional formula (III) below.</p>
申请公布号 KR20070062965(A) 申请公布日期 2007.06.18
申请号 KR20077000325 申请日期 2007.01.05
申请人 FUJI FILM CORPORATION 发明人 IWASAKI MASAYUKI
分类号 G03F7/035;C08G18/08;C08G18/32;C09D175/16;G03F7/004;G03F7/20;H01L21/027;H05K3/28 主分类号 G03F7/035
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