| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition suitable for excimer laser lithography, having good resist performances such as sensitivity and resolution and excellent in dry etching resistance. <P>SOLUTION: The chemically amplified positive resist composition contains an acid generator and a resin which contains at least one polymerized unit selected from the group comprising polymerized units represented by formula (Ia) and polymerized units represented by formula (Ib) and a polymerized unit having an epoxy group selected from formula (II), is insoluble or slightly soluble in an aqueous alkali solution and is made soluble in the aqueous alkali solution by the action of an acid. In the formulae (Ia) and (Ib), R<SB>1</SB>-R<SB>4</SB>are independently H or methyl and n is an integer of 1-3. In the formula (II), R<SB>6</SB>and R<SB>7</SB>are independently H or alkyl and m is an integer of 1-8. <P>COPYRIGHT: (C)2003,JPO |
