Method of forming a barrier layer in a semiconductor device,申请号KR20010002698-传众专利搜索

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发明名称	Method of forming a barrier layer in a semiconductor device
摘要
申请公布号	KR100724143(B1)	申请公布日期	2007.06.04
申请号	KR20010002698	申请日期	2001.01.17
申请人		发明人
分类号	H01L21/283	主分类号	H01L21/283
代理机构		代理人
主权项
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