发明名称 Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby
摘要 A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.
申请公布号 US2007117028(A1) 申请公布日期 2007.05.24
申请号 US20060599585 申请日期 2006.11.15
申请人 ASML NETHERLANDS B.V. 发明人 HEERENS GERT-JAN;HAM ERIK L.;WILHELMUS MARINUS VAN DE VEN BASTIAAN L.
分类号 G03F1/00;B65G49/00;G03B27/62;G03F7/20;H01L21/027;H01L21/673;H01L21/68;H01L21/683 主分类号 G03F1/00
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