发明名称 |
Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby |
摘要 |
A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.
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申请公布号 |
US2007117028(A1) |
申请公布日期 |
2007.05.24 |
申请号 |
US20060599585 |
申请日期 |
2006.11.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HEERENS GERT-JAN;HAM ERIK L.;WILHELMUS MARINUS VAN DE VEN BASTIAAN L. |
分类号 |
G03F1/00;B65G49/00;G03B27/62;G03F7/20;H01L21/027;H01L21/673;H01L21/68;H01L21/683 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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