A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam having a focus; and a carrier movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge. The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma. The system is cooperable with a mirror for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface and means for supplying a reflecting liquid to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.
申请公布号
WO2007051537(A2)
申请公布日期
2007.05.10
申请号
WO2006EP10187
申请日期
2006.10.23
申请人
UNIVERSITY COLLEGE DUBLIN, NATIONAL UNIVERSITY OFIRELAND, DUBLIN;O'REILLY, FERGAL;HAYDEN, PATRICK;O'SULLIVAN, GERARD;DUNNE, PADRAIG