DEVICE AND METHOD FOR COATING JET-TYPE PHOTORESIST EFFICIENTLY USING PHOTORESIST SOLUTION

摘要

PROBLEM TO BE SOLVED: To provide a device for coating a jet-type photoresist capable of efficiently utilizing a photoresist solution.

SOLUTION: The device: includes an upper plate 230 which is grounded, and an ionized solvent vapor introducing pipe 241; and retains an atmosphere of ionized solvent vapor between a lower substrate 220 biased with a predetermined voltage and an upper jet nozzle 240, using the upper plate 230 and the solvent vapor introducing pipe 241. The loss of photoresist droplets is reduced to an irreducible minimum, and the front surface of the substrate is uniformly coated with the photoresist at the same time.

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