| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of selectively depositing a thin film on a substrate of a large area without using any shadow mask. SOLUTION: An evaporation source 100 comprises a cylindrical cell 128, a lower heater 134 and an upper heater 136 for heating the cylindrical cell. A heating plate 130 is capable of controlling the temperature by a heater 138 provided on the inner side thereof. The heating plate 130 heats a vapor deposition material to be fed into the cylindrical cell 128 from a material feed unit 102 connected thereto, and vaporizes the vapor deposition material by evaporation or sublimation. A rotating mechanism 132 for rotating the heating plate 130 in the cylindrical cell 128 may be provided to unify the temperature therein. A heater 140 for heating the material feed unit 102 may be provided to raise the temperature of the vapor deposition material to be fed in the cylindrical cell 128. The evaporation source 100 is capable of continuously performing the film deposition with excellent uniformity on a substrate of a large area. COPYRIGHT: (C)2007,JPO&INPIT |
