| 摘要 |
<p>A device manufacturing method includes performing field-by-field multiple exposure. In this way, each target portion (or field) of a substrate can be irradiated while maintaining high overlay accuracy. Optionally, when each target portion is exposed in the same manner, a high reproducibility of the feature sizes on the substrate can be secured. Further, a mask table holds a plurality of masks that are arranged side-by-side in a direction substantially perpendicular to a scan direction. Such an arrangement enables field-by-field multiple exposure without a throughput loss.</p> |
