| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an electro-optical device, which is capable of preventing electrostatic discharge of a TFT element to improve yield and is capable of reducing the number of manufacturing steps. <P>SOLUTION: The method of manufacturing an electro-optical device includes steps of; forming a gate electrode 31, a gate electrode line 20, and peripheral common wiring 51 on a mother board 7a' in a state of connecting to each other; forming a gate insulating film material 32' and a semiconductor film material 33' into films with the wiring 51 partially covered with a holding claw 56; removing the holding claw 56 from the mother board 7a' to form an exposed part E of the wiring 51 and then applying a resist and patterning the resist and etching the semiconductor film material 33' with the resist pattern as a mask to form a semiconductor film 33; forming materials of a source electrode 35 and a drain electrode 36 into films after peeling the resist; and patterning this material to form the source electrode 35 and the drain electrode 36. <P>COPYRIGHT: (C)2007,JPO&INPIT |
