| 摘要 |
<P>PROBLEM TO BE SOLVED: To make plasma density generated in a reaction chamber uniform. <P>SOLUTION: A microwave introduction window 6 is placed below a dielectric line 5 facing to it with a predetermined interval. The dielectric line 5 is provided with a plate type line body and thickness adjustment part 5a established at the center of the lower surface of the line body. The line body and thickness adjustment part 5a are made of fluororesin. The thickness adjustment part 5a is a circular ring having a rectangular cross section and arranged so that the etching rate of the sample S placed on a sample stand 9 in a reaction chamber 10 corresponds to the highest region. <P>COPYRIGHT: (C)2007,JPO&INPIT |
