| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive paste capable of performing a pattern formation by a single exposure even in the case of a thick film of >50 μm, and capable of producing barrier ribs which ensure a small change in pattern size before and after baking. <P>SOLUTION: The photosensitive paste comprises: (A) inorganic particles; (B) a novolac resin obtained by polycondensing a phenol compound and formaldehyde or an aldehyde compound selected from a long chain aldehyde, etc., and/or a resin obtained by substituting part of the phenolic hydroxyl groups of the novolac resin by OR<SB>3</SB>groups (wherein R<SB>3</SB>represents a 1-20C monovalent organic group); (C) an epoxy group-containing silicon compound; (D) a compound which generates an acid under ionizing radiation; and (E) an organic solvent having a refractive index at 25°C of 1.40-1.80. Barrier ribs for a plasma display using the photosensitive paste and a member for a plasma display equipped with the barrier ribs are also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
