发明名称 Manufacturing method of a display device
摘要 The present invention provides a manufacturing method of a display device which can decrease the lowering of a yield rate of the display device attributed to the aggregations generated by pseudo single crystallization of a silicon film. A manufacturing method of a display device includes a semiconductor film reforming step which reforms a semiconductor film into a second state in which the semiconductor film possesses elongated crystalline particles by radiating a laser beam to the semiconductor film in a first state, an aggregation detecting step which detects the aggregation of the semiconductor film which is generated in the semiconductor film reforming step, and a defect determination step which determines a product as a defective product when a position of the aggregation is present in the inside of the predetermined region and determines the product as a good product when the position of the aggregation is present outside the predetermined region.
申请公布号 US2007072349(A1) 申请公布日期 2007.03.29
申请号 US20060509739 申请日期 2006.08.25
申请人 KAITOH TAKUO;OUE EIJI;ITOGA TOSHIHIKO 发明人 KAITOH TAKUO;OUE EIJI;ITOGA TOSHIHIKO
分类号 H01L21/84;H01L21/00 主分类号 H01L21/84
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