发明名称 |
Manufacturing method of a display device |
摘要 |
The present invention provides a manufacturing method of a display device which can decrease the lowering of a yield rate of the display device attributed to the aggregations generated by pseudo single crystallization of a silicon film. A manufacturing method of a display device includes a semiconductor film reforming step which reforms a semiconductor film into a second state in which the semiconductor film possesses elongated crystalline particles by radiating a laser beam to the semiconductor film in a first state, an aggregation detecting step which detects the aggregation of the semiconductor film which is generated in the semiconductor film reforming step, and a defect determination step which determines a product as a defective product when a position of the aggregation is present in the inside of the predetermined region and determines the product as a good product when the position of the aggregation is present outside the predetermined region.
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申请公布号 |
US2007072349(A1) |
申请公布日期 |
2007.03.29 |
申请号 |
US20060509739 |
申请日期 |
2006.08.25 |
申请人 |
KAITOH TAKUO;OUE EIJI;ITOGA TOSHIHIKO |
发明人 |
KAITOH TAKUO;OUE EIJI;ITOGA TOSHIHIKO |
分类号 |
H01L21/84;H01L21/00 |
主分类号 |
H01L21/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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