发明名称 Method for producing resin for chemically amplified positive resist
摘要 A method for producing a resin for a chemically amplified positive resist by polymerizing at least one monomer and/or at least one oligomer which is polymerized to provide a resin for a chemically amplified positive resist, in which two or more polymerization initiators are used to initiate the polymerization, thereby the resin is obtained at a high yield.
申请公布号 US2007072120(A1) 申请公布日期 2007.03.29
申请号 US20060528443 申请日期 2006.09.28
申请人 SUMITOMO SEIKA CHEMICALS CO., LTD. 发明人 OKAZAKI SHINYA;OKAMOTO MASAFUMI;FUJI YUSUKE;FUJISHIMA HIROAKI
分类号 G03C1/00 主分类号 G03C1/00
代理机构 代理人
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