发明名称 |
Method for producing resin for chemically amplified positive resist |
摘要 |
A method for producing a resin for a chemically amplified positive resist by polymerizing at least one monomer and/or at least one oligomer which is polymerized to provide a resin for a chemically amplified positive resist, in which two or more polymerization initiators are used to initiate the polymerization, thereby the resin is obtained at a high yield.
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申请公布号 |
US2007072120(A1) |
申请公布日期 |
2007.03.29 |
申请号 |
US20060528443 |
申请日期 |
2006.09.28 |
申请人 |
SUMITOMO SEIKA CHEMICALS CO., LTD. |
发明人 |
OKAZAKI SHINYA;OKAMOTO MASAFUMI;FUJI YUSUKE;FUJISHIMA HIROAKI |
分类号 |
G03C1/00 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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