METHOD OF FABRICATING SHALLOW TRENCH ISOLATION STRUCTURE

摘要

A method of fabricating a shallow trench isolation structure is provided. A substrate having a patterned pad layer is provided. A part of the substrate is removed by using the patterned pad layer as a mask and a trench is thus formed in the substrate. A first insulation layer is formed on the substrate, the patterned pad layer and the trench. A second insulation layer is formed on the first insulation layer and partially fills into the trench. A third insulation layer is formed on the substrate and fills in the trench. The third insulation layer on the patterned pad layer and the patterned pad layer are removed subsequently.