| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint material by which the occurrence of defects can be reduced when a metal oxide film having a projecting and recessed pattern is formed on a doughnut type substrate such as a hard disk by spin coating and imprint and to provide a pattern formation method. SOLUTION: In the pattern formation method, the imprint material containing a metal oxide film precursor selected from the group consisting of a metal alkoxide and a metal oxide and an ether based non-ionic surfactant containing fluorine or silicon is applied on the doughnut type substrate having a hole at its center part, a stamper having the projecting and recessed pattern is pushed to the imprint material to transfer the projecting and recessed pattern of the stamper to the imprint material and an organic component is removed from the imprint material by plasma or heat treatment to form the metal oxide film having the projecting and recessed pattern. COPYRIGHT: (C)2007,JPO&INPIT
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