| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning agent or a rinsing agent for lithography excellent in dissolving and stripping properties on a resist, antireflection film or the like. SOLUTION: The cleaning agent or the rinsing agent for lithography comprises at least one kind of solvent (A) selected from a group consisting of (a1) propyleneglycol-1-alkyletheracetate, (a2) 1,3-butanediol-3-alkyletheracetate and (a3) alkyl ester of acetic acid, and at least one kind of solvent (B) selected from a group consisting of (b1) propyleneglycol-1-alkylether and (b2) 1,3-butanediol-3-alkylether, and can produce a homogeneous solution when mixed with an equal volume of water. COPYRIGHT: (C)2007,JPO&INPIT |
