| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of making the temperature of a wafer on a susceptor uniform even in the case of applying precoat on the susceptor supporting the wafer, and provide the susceptor used for the same. SOLUTION: An annular recess part 12a is formed in the circumference of the center part of a wafer supporting surface of a susceptor 12. The recess part 12a is formed as a groove between a central projection part 12b at the center part of the susceptor 12 and a peripheral projection part 12c of the peripheral part of the susceptor 12. By this recess part 12a, a space allowing the temperature within the surface of the supported wafer W to be uniform according to the pressure in the chamber is formed between the mounted wafer W and the susceptor 12. COPYRIGHT: (C)2007,JPO&INPIT |
