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发明名称
INDUCTIVELY COUPLED PLASMA PROCESS CHAMBER WITH SHIELD ELECTRODE INTERPOSED BETWEEN ANTENNA AND DIELECTRIC WINDOW
摘要
申请公布号
KR100695597(B1)
申请公布日期
2007.03.14
申请号
KR20027000477
申请日期
2002.01.12
申请人
发明人
分类号
H01J37/32
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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