| 摘要 |
PROBLEM TO BE SOLVED: To improve throughput while obtaining a cleaning system which can continue cleaning, in a cleaning system using persulfate ions. SOLUTION: The sulfuric acid recycling type cleaning system comprises: a single wafer process cleaning equipment 1 for cleaning a material 30 to be cleaned by using a persulfuric acid solution as a cleaning fluid; electrolysis reaction tubs 20 and 25 for reproducing the persulfuric acid solution by generating persulfate ions from sulfuric acid ions contained in the solution by an electrolysis reaction; circulation lines 10a, 10b, 11a and 11b for circulating the persulfuric acid solution between a cleaning tub 1 and the electrolysis reaction tubs 20 and 25 which generate; and an ultraviolet-ray irradiation means 5 for irradiating ultraviolet-ray to the material 30 to be cleaned. Since a sulfuric acid solution is repeatedly used, the persulfuric acid solution can be reused in an on-site way for cleaning by utilizing an electrolysis reaction device. When cleaning, the generation of the sulfuric acid radicals is promoted while being irradiated by ultraviolet-ray to the cleaning solution, resulting in the improvement in the cleaning effect. It becomes possible to shorten working hours and to improve the throughput. COPYRIGHT: (C)2007,JPO&INPIT
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