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发明名称
Atomic layer deposition apparatus and process
摘要
申请公布号
KR100683441(B1)
申请公布日期
2007.02.20
申请号
KR20047005656
申请日期
2004.04.16
申请人
发明人
分类号
C23C16/44;C23C16/455;H01L21/205
主分类号
C23C16/44
代理机构
代理人
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地址
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