| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus 1 having improved productivity. SOLUTION: This vacuum treatment apparatus comprises: a plurality of carriers each for mounting a substrate thereon; a vacuum circulation path 8 through which the carriers circulate; a first carrying-in-and-out chamber 10 and a second carrying-in-and-out chamber 20 which are arranged in the vacuum circulation path 8, and charges and removes the substrate to and from the carrier; a first film-forming chamber 15 which is arranged in the vacuum circulation path 8 between the first carrying-in-and-out chamber 10 and the second carrying-in-and-out chamber 20, and a second film-forming chamber 25 which is arranged in the vacuum circulation path 8 between the second carrying-in-and-out chamber 20 and the first carrying-in-and-out chamber 10. It is possible to form different films from each other respectively in the first film-forming chamber 15 and the second film-forming chamber 25. COPYRIGHT: (C)2007,JPO&INPIT
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