发明名称 HEATING DEVICE OF VACUUM DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce the affection of thermal expansion in a stage mechanism caused by a high temperature. SOLUTION: The heating device of the vacuum device is provided with the heating device 3 inside a vacuum chamber 2 in the vacuum device 1 having the stage mechanism 4 inside the vacuum chamber 2, the heating device 3 is provided with a heater 3a and a reflector 3b provided between the heater 3a and at least a part of the stage mechanism 4. The reflector 3b reflects thermal radiation from the heater 3a, suppresses thermal transmission to the stage mechanism 4, and prevent the stage mechanism 4 from being at a high temperature to reduce the thermal expansion of the stage mechanism caused by the high temperature. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007036031(A) 申请公布日期 2007.02.08
申请号 JP20050219089 申请日期 2005.07.28
申请人 SHIMADZU CORP 发明人 KONISHI YASUO
分类号 H01L21/68 主分类号 H01L21/68
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