A WAFER TRANSFER DEVICE OF WAFER ETCHING EQUIPMENT

摘要

A wafer transfer device of wafer etching equipment is provided to clean contaminants including particles on a surface of a wafer by using a nitrogen gas nozzle. A transfer arm unit(11) is used for mapping each wafer slot and detecting a wafer notch in order to be moved to the detected wafer notch. A chuck unit(21) holds and fixes a backside of a wafer in a state of lift chuck vacuum by using venturi vacuum in order to fix the wafer. A gas nozzle unit(23) is installed at the chuck unit. The gas nozzle unit discharges gas to clean a surface of the wafer while the chuck unit is in the state of lift chuck vacuum. The gas is composed of N2 gas.