| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photonic crystal element capable of sufficiently exhibiting the optical characteristic when an AR film is formed. <P>SOLUTION: The photonic crystal element is produced by successively laminating dielectric layers on the surface of a substrate having a triangular cross section shape. That is, the substrate is formed of anisotropic material of silicon etc. and is subjected to anisotropic etching, thereby, a recessed surface having a triangular cross section shape is formed on the substrate and, thereon, a multilayer film made of dielectric layers is produced. On the laminate formed in such a manner, a final layer having a film thickness T=λ/(4n) is formed according to a spin coat method, wherein n is refractive index and λ is wavelength of light. <P>COPYRIGHT: (C)2007,JPO&INPIT |
