发明名称 PHOTOSENSITIVE COMPOSITION, IMAGE RECORDING MATERIAL AND IMAGE RECORDING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition excellent in storage stability, work efficiency and economical efficiency, adaptable to a CTP system, usable as an image recording material of a lithographic printing plate for scanning exposure having high sensitivity to an oscillation wavelength of an inexpensive short-wavelength semiconductor laser, and using a new photopolymerization initiation system having high sensitivity to various wavelengths of 350-850 nm. <P>SOLUTION: The photosensitive composition contains (A) a biimidazole type compound of a specific structure, (B) a sensitizing dye having an absorption maximum &lambda;<SB>max</SB>at 350-850 nm and (C) an addition polymerizable compound which reacts with at least one of a radical and an acid. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007011046(A) 申请公布日期 2007.01.18
申请号 JP20050192515 申请日期 2005.06.30
申请人 FUJIFILM HOLDINGS CORP 发明人 ISHICHI YOHEI;FUKUNAGA HIROO
分类号 G03F7/028;C07D233/64;C07D401/14;C07D403/14;C07D405/14;C07D409/14;C08F2/50;G03F7/00 主分类号 G03F7/028
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