| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a double exposure method using a double exposure technology where it is unnecessary that a photo mask is exchanged between a first exposure and a second exposure, and to provide a photo mask used for the double exposure method. <P>SOLUTION: The double exposure method includes a stage performing first exposure to which the 2-beam imaging of zero-order light and minus first-order light, or zero-order light and plus first-order light is applied using a photo mask 600 to form a first pattern 710; and a stage performing second exposure to which the 3-beam imaging of zero-order and ±first order light is applied using the photo mask 600 to form a second pattern. <P>COPYRIGHT: (C)2007,JPO&INPIT |
